Microwave plasma chemical vapor deposition of nano-composite C/Pt thin-films

Microwave plasma chemical vapor deposition of nano-composite C/Pt thin-films

TitleMicrowave plasma chemical vapor deposition of nano-composite C/Pt thin-films
Publication TypeJournal Article
Year of Publication2007
AuthorsMarek Marcinek, Xiangyun Song, Robert Kostecki
JournalElectrochemistry Communications
Volume9
1739
Issue7
Pagination1739-1743
Date Published07/2007
Keywordsc/pt, catalyst, microwave, plasma
Abstract

Composite carbon–platinum thin-films of nano-crystalline graphitic carbon decorated with uniformly-dispersed 2–4 nm Pt nano-particles have been synthesized from a solid organic precursor by a one-step microwave plasma chemical vapor deposition (MPCVD). The fast Ar-plasma discharge and the presence of microwave radiation accelerate the formation of sites suitable for in situ heterogeneous nucleation, and consequently, the fine dispersion of metal in the carbonaceous matrix. The electrochemical response of the 2 μm C/Pt thin-film electrode displays electrochemical activity, which is attributed to the high ca. 18 m2/g effective surface area of Pt nano-particles.

Notes

1388-2481doi: DOI: 10.1016/j.elecom.2007.03.030

DOI10.1016/j.elecom.2007.03.030