Electric-field-intensity-modulated scattering as a thin-film depth probe

Electric-field-intensity-modulated scattering as a thin-film depth probe

TitleElectric-field-intensity-modulated scattering as a thin-film depth probe
Publication TypeJournal Article
Year of Publication2020
AuthorsPeter J Dudenas, Adam Z Weber, Ahmet Kusoglu
JournalJournal of Applied Crystallography
Volume53
1484
Issue6
Pagination1484 - 1492
Date Published11/2020
Abstract

Grazing-incidence X-ray scattering is a common technique to elucidate nanostructural information for thin-film samples, but depth-resolving this nanostructure is difficult using a single or few images. An in situ method to extract film thickness, the index of refraction and depth information using scattering images taken across a range of incident angles is presented here. The technique is described within the multilayer distorted-wave Born approximation and validated using two sets of polymer thin films. Angular divergence and energy resolution effects are considered, and implementation of the technique as a general beamline procedure is discussed. Electric-field-intensity-modulated scattering is a general technique applicable to myriad materials and enables the acquisition of depth-sensitive information in situ at any grazing-incidence-capable beamline.

DOI10.1107/S160057672001304710.1107/S1600576720013047/ge5076sup1.pdf
Short TitleJ Appl Crystallography
Refereed DesignationRefereed